Application areas

Biomedical Life Sciences

Optical communication

Attenuator

IC equipment and infrared optics

Projection Display and Professional Lighting

Machine Vision

Laser military astronomy

IC lithography equipment, FPD exposure equipment

Precision optical thin film devices used in IC semiconductor lithography equipment and FPD flat panel display exposure equipment have extremely demanding requirements for optical mirror accuracy, spectral reflection efficiency and durability. The light source works continuously for a long time, and the radiation damage of ultraviolet rays has high requirements on the life of the film layer of the reflector. The precision ultraviolet optical thin film devices manufactured by Huibo Optics all adopt high-energy ion-assisted deposition process, which can withstand high temperatures above 400 ℃ and have stable performance.

Product type: large size ellipsoid mirror, 45 ° plane mirror, dielectric film mirror, aluminum enhanced mirror, 365nm passband filter, cut-off filter, dichroic mirror, optical alignment mirror.