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IC lithography equipment, FPD exposure equipment

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ADD:No.242 Beihai Street, Dadong District, Shenyang City, Liaoning Province

TLL:024-88722463(Filter)

  024-88710226(Reflector) 

  024-88710538(International)          

FAX:024-88722312(Filter)

      024-88710655(Reflector)

EMAIL:info@hb-optical.com

IC lithography equipment, FPD exposure equipment

IC lithography equipment, FPD exposure equipment

Description:         The precision optical thin film devices used in IC semiconductor lithography equipment and FPD flat panel display exposure equipment have extremely stringent requirements for the use of optical mirror accuracy, spectral reflection efficiency and durability. The light source works continuously for a long time, and the radiation damage of ultraviolet rays requires a high lifetime of the film of the mirror. High energy ion assisted deposition technology is used in the Precision UV optical thin film devices manufactured by Huibo optics, which can withstand high temperature above 400 ℃ and have stable performance.   Product type: large size ellipsoid mirror, 45 ° plane mirror, dielectric film mirror, aluminum enhanced mirror, 365nm passband filter, cut-off filter, dichroic mirror, optical directional mirror.         
Description:         The precision optical thin film devices used in IC semiconductor lithography equipment and FPD flat panel display exposure equipment have extremely stringent requirements for the use of optical mirror accuracy, spectral reflection efficiency and durability. The light source works continuously for a long time, and the radiation damage of ultraviolet rays requires a high lifetime of the film of the mirror. High energy ion assisted deposition technology is used in the Precision UV optical thin film devices manufactured by Huibo optics, which can withstand high temperature above 400 ℃ and have stable performance.   Product type: large size ellipsoid mirror, 45 ° plane mirror, dielectric film mirror, aluminum enhanced mirror, 365nm passband filter, cut-off filter, dichroic mirror, optical directional mirror.         
Information

     

  The precision optical thin film devices used in IC semiconductor lithography equipment and FPD flat panel display exposure equipment have extremely stringent requirements for the use of optical mirror accuracy, spectral reflection efficiency and durability. The light source works continuously for a long time, and the radiation damage of ultraviolet rays requires a high lifetime of the film of the mirror. High energy ion assisted deposition technology is used in the Precision UV optical thin film devices manufactured by Huibo optics, which can withstand high temperature above 400 ℃ and have stable performance.

  Product type: large size ellipsoid mirror, 45 ° plane mirror, dielectric film mirror, aluminum enhanced mirror, 365nm passband filter, cut-off filter, dichroic mirror, optical directional mirror.

 

  

 

 

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